International Standard
ISO 22415:2019
Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
Reference number
ISO 22415:2019
Edition 1
2019-05
International Standard
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ISO 22415:2019
73135
Published (Edition 1, 2019)

ISO 22415:2019

ISO 22415:2019
73135
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Format
CHF 151
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Abstract

This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.

General information

  •  : Published
     : 2019-05
    : International Standard under systematic review [90.20]
  •  : 1
     : 30
  • ISO/TC 201/SC 6
    71.040.40 
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